Benchtop Spark OES
Hitachi - OE720
OE720 Spetrometer for laboratory use with very high precision, has a very wide analytical wavelength range: 174 - 670 nm (can be extended to 766 nm)
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Technical Description
- Using many outstanding technologies such as CMOS sensor, Jet-stream technology, auto profiling
- Alloy analysis spectrometers using emission spectroscopy are very popular in alloy analysis due to their ability to analyze the carbon element.
- The device's new generation of spark generators ensures optimal excitation for a wide range of alloys.
- High resolution Multi-CMOS optics allows precise analysis over the entire spectral range for all alloys with different matrices
- The sample holder with 3-dimensional open structure allows safe and efficient analysis of samples with different shapes, including irregular shapes.
- Ability to analyze up to 35 elements (depending on alloy type);
- Supplied with a GRADE database with more than 350,000 alloy grades according to more than 15 million different names from 70 countries and many standards (DIN/EN, ASTM, AISI, JIS, Gost...)
- Share data instantly ONLINE via Cloud Server with ExTope Connect function
Applications
- Quality control for process and melt verification: analysis mode/grade identification
- All relevant alloying, residual, treatment, trace and tramp elements with low limits of detection
- Al alloy
- Copper alloys: Bronze, Messing, Cu-Ni
- Ni alloy (N 20 ppm)
- Mg, Co, Pb, Sn, Zn alloy
Specifications
| Overview | |
| Size | 425 mm x 760 mm x 535mm (WxDxH) |
| Power supply | 100 - 250 V AC (50/60 Hz) |
| Mass | 84kg |
| Power consumption | Max 430W |
| Standby power consumption | 45W (50W Source on) |
| Argon gas | |
| Purity | Min 4.8 |
| Inlet pressure | 3 Bar |
| Optical system | |
| Optical system | According to the Paschen-Runge Mounting principle |
| Direct light transmission to the optical chamber. | |
| Analysis wavelength range | 174 - 670nm (expandable to 766 nm) |
| Sensor | Multi-CMOS sensor (4096 pixels per chip) with optimized Pixel resolution. |
| Contrast | |
| Focal length | 400 mm |
| Groove density | |
| Vacuum system | The pump has a capacity of 700w, low noise, low heat generation and no pump maintenance required. |
| Connection via Shut-off-valve, easy maintenance and replacement of optical window | |
| Plasma generator | High Energy Electric Spark (HEPS) technique for better sample combustion |
| Set parameters using software | |
| Frequency: 80 – 1000 Hz | |
| Voltage: 250 - 500 V | |
| Sample holder set | Sample holder set with 3-dimensional open structure, can hold samples of any size |
| Jet-Stream-electrode structure for working on small samples and samples with complex shapes. Optimized Argon consumption is lowest. | |
| Multi-adjustable sample clamp | |
| The cover plate can be changed for different models. | |
| Limit of factorization of a prime number | C: 10ppm; Si: 10ppm; P: 2ppm; S:5ppm; N: 500ppm; B:1ppm |
